Ridgefield, CT, United States of America

Huihang Dong


Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Danbury, CT (US) (2015 - 2016)
  • Ridgefield, CT (US) (2016 - 2017)

Company Filing History:


Years Active: 2015-2017

where 'Filed Patents' based on already Granted Patents

6 patents (USPTO):

Title: Innovations of Inventor Huihang Dong

Introduction

Huihang Dong is a prominent inventor based in Ridgefield, CT, known for his significant contributions to the field of integrated circuits. With a total of six patents to his name, he has developed innovative solutions that address critical challenges in device degradation and circuit design.

Latest Patents

One of his latest patents is titled "Patterning scheme to minimize dry/wet strip induced device degradation." This patent presents a method that involves removing a workfunction material over a first device area while protecting it over a second area using a first masking material. The process further includes applying a second masking material and subsequently removing both masking materials to expose the workfunction material over the second device area.

Another notable patent is "Integrated circuit with replacement gate stacks and method of forming same." This invention describes an integrated circuit structure that includes a first replacement gate stack for the pFET and a second replacement gate stack for the nFET. The design incorporates various layers, including interfacial layers, high-k layers, and work function metal layers, to enhance the performance of the integrated circuit.

Career Highlights

Huihang Dong has worked with leading technology companies, including International Business Machines Corporation (IBM) and Globalfoundries Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Huihang has collaborated with notable professionals in the field, including Wai-Kin Li and Ruqiang Bao. These collaborations have fostered an environment of innovation and have led to the development of several impactful technologies.

Conclusion

Huihang Dong's work exemplifies the spirit of innovation in the field of integrated circuits. His patents and collaborations reflect his commitment to advancing technology and addressing the challenges faced in modern electronics.

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