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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9627272 B1

PDFFull Text
Date of Patent:
Apr. 18, 2017

Filed:

Aug. 24, 2015

Patterning scheme to minimize dry/wets strip induced device degradation

Applicant:

Globalfoundries Inc., George Town, KY;

Inventors:

Huihang Dong, Ridgefield, CT (US);

Wai-Kin Li, Hopewell Junction, NY (US);

Assignee:

GLOBALFOUNDRIES INC., George Town, KY;

Attorneys:

Yuanmin Cai

Andrew M. Calderon

Roberts Mlotkowski Safran Cole & Calderon, P.C.

Primary Examiner:

Trung Q Dang

Assistant Examiner:

Frederick B Hargrove

Int. Cl.
CPC ...
H01L 21/3205 (2006.01); H01L 21/8238 (2006.01); H01L 21/3213 (2006.01); H01L 21/28 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823842 (2013.01); H01L 21/02118 (2013.01); H01L 21/28088 (2013.01); H01L 21/32139 (2013.01);
Abstract

A patterning scheme to minimize dry/wet strip induced device degradation and resultant devices are provided. The method includes removing a workfunction material over a first device area of a structure, while protecting the workfunction material over a second device area of the structure with a first masking material. The method further includes applying a second masking material over the first device area and the first masking material. The method further includes removing the first masking material and the second masking material until the workfunction material is exposed over the second device area.

Find Patent Forward Citations

Dong, Huihang. (2017). Patterning scheme to minimize dry/wets strip induced device degradation (U.S. Patent No. 9627272). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9627272

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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