Hui-Min Mao

Title: Hui-Min Mao: Innovator in Semiconductor Technology

Introduction

Hui-Min Mao is a distinguished inventor based in Taipei, Taiwan, known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 18 patents, Mao has made substantial advancements that support the development of more efficient electronic devices.

Latest Patents

Mao's latest innovations include two notable patents. The first is an "Overlay alignment mark and alignment method for the fabrication of trench-capacitor DRAM devices." This invention introduces a small-size alignment mark, combined with a 'k1 process,' which is especially advantageous for creating trench-capacitor DRAM devices that demand high accuracy in overlay alignment. The innovative 'k1 process' is adept at etching polysilicon from the alignment mark trenches, enhancing overlay alignment accuracy and precision.

The second patent is a "Fabrication method for a damascene bit line contact plug." This method entails the formation of a semiconductor substrate with a first and a second gate conductive structure. A first conductive layer is strategically placed between these structures to connect electrically with a source/drain region. Following this, an inter-layer dielectric with a planarized surface covers the conductive layer and the gate structures. The method culminates with the creation of a bit line contact hole, where a second conductive layer is added to function as a damascene bit line contact plug.

Career Highlights

Mao is currently employed at Nan Ya Technology Corporation, an esteemed firm in the technology sector where he actively contributes to pioneering advances in semiconductor devices. His extensive experience and innovative thinking have positioned him as a key player in the industry, driving forward the capabilities of modern electronics.

Collaborations

Throughout his career, Hui-Min Mao has worked alongside talented colleagues such as Yi-Nan Chen and Chih-Yuan Hsiao. Their collaborative efforts have fostered an environment of innovation and creativity, leading to significant breakthroughs in semiconductor technology.

Conclusion

Hui-Min Mao's contributions significantly influence the semiconductor industry, showcasing how innovations can pave the way for enhanced technology. His impressive track record of patents reflects a deep commitment to advancing electronic devices that meet the growing demands of the market. As the field of semiconductor technology continues to evolve, Mao's work will undoubtedly remain at the forefront of innovation.