Hua-Wei Peng

Title: Innovations of Hua-Wei Peng

Introduction

Hua-Wei Peng is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of lithography and substrate processing, holding a total of three patents. His work is primarily associated with United Microelectronics Corporation, where he has developed advanced technologies that enhance manufacturing processes.

Latest Patents

Hua-Wei Peng's latest patents include a lithography system and a method for detecting fluid leakage in liquid storage tanks. The lithography system features an immersion lithographic apparatus, a fluid supply device, and a sensor. The fluid supply is designed to provide fluid to the immersion lithographic apparatus, which includes at least one liquid storage tank, an upper liquid pipe, and a lower liquid pipe. The sensor, equipped with hydraulic pressure gauges, measures the hydraulic pressure at the bottom of the liquid storage tank, allowing for the calculation of the liquid level. Another patent involves a substrate processing apparatus that integrates a process station and a cassette station. This apparatus includes a substrate carriage for transferring substrates and a substrate scanner that captures surface image data during transportation.

Career Highlights

Throughout his career, Hua-Wei Peng has demonstrated a commitment to innovation in semiconductor manufacturing. His patents reflect a deep understanding of the technical challenges faced in the industry and provide solutions that enhance efficiency and reliability.

Collaborations

Hua-Wei Peng has collaborated with notable colleagues such as Jy-Hwang Lin and Wen-Chieh Wang. Their combined expertise has contributed to the successful development of advanced technologies in their field.

Conclusion

Hua-Wei Peng's contributions to lithography and substrate processing exemplify the spirit of innovation in the semiconductor industry. His patents not only address current challenges but also pave the way for future advancements.