Hsiu-Lien Liao

Title: Hsiu-Lien Liao: Innovator in Strained-Silicon Technology

Introduction

Hsiu-Lien Liao is a prominent inventor based in Tai-Chung, Taiwan. She has made significant contributions to the field of semiconductor technology, particularly in the development of strained-silicon transistors. With a total of 5 patents to her name, Liao continues to push the boundaries of innovation in her field.

Latest Patents

Among her latest patents is the "Strained-silicon transistor and method of making the same." This invention describes a structure of a strained-silicon transistor that includes a PMOS disposed on a substrate, a silicon nitride layer positioned on the PMOS, and a compressive stress film disposed on the silicon nitride layer. The silicon nitride has a stress between -0.1 Gpa and -3.2 Gpa, and the stress of the silicon nitride is smaller than that of the compressive stress layer. Another notable patent is the "Method for fabricating high tensile stress film." This method and apparatus involve providing a substrate, forming a poly stressor on the substrate, and performing an ultra violet rapid thermal process (UVRTP) for curing the poly stressor and adjusting its tensile stress status. This innovative approach allows for the adjustment of the tensile stress status of the high tensile stress film in a relatively shorter process period or under a lower temperature.

Career Highlights

Hsiu-Lien Liao is currently employed at United Microelectronics Corporation, where she applies her expertise in semiconductor technology. Her work has been instrumental in advancing the capabilities of strained-silicon transistors, which are crucial for enhancing the performance of electronic devices.

Collaborations

Liao collaborates with several talented individuals in her field, including her coworkers Teng-Chun Tsai and Neng-Kuo Chen. These collaborations foster an environment of innovation and creativity, leading to groundbreaking advancements in semiconductor technology.

Conclusion

Hsiu-Lien Liao is a remarkable inventor whose work in strained-silicon technology has made a significant impact on the semiconductor industry. Her innovative patents and collaborations continue to drive advancements in this critical field.