The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Jun. 05, 2007
Hsiu-lien Liao, Tai-Chung, TW;
Neng-kuo Chen, Hsin-Chu, TW;
Teng-chun Tsai, Hsin-Chu, TW;
Yi-wei Chen, Tai-Chung Hsien, TW;
Hsiu-Lien Liao, Tai-Chung, TW;
Neng-Kuo Chen, Hsin-Chu, TW;
Teng-Chun Tsai, Hsin-Chu, TW;
Yi-Wei Chen, Tai-Chung Hsien, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A method and an apparatus for fabricating a high tensile stress film includes providing a substrate, forming a poly stressor on the substrate, and performing an ultra violet rapid thermal process (UVRTP) for curing the poly stressor and adjusting its tensile stress status, thus the poly stressor serves as a high tensile stress film. Due to a combination of energy from photons and heat, the tensile stress status of the high tensile stress film is adjusted in a relatively shorter process period or under a relatively lower temperature.