Hsin-Wei Wu

Title: Hsin-Wei Wu: Innovator in Electron Beam Lithography

Introduction

Hsin-Wei Wu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of electron beam lithography, holding a total of 8 patents. His innovative work focuses on improving the efficiency and effectiveness of lithography processes used in semiconductor manufacturing.

Latest Patents

One of Hsin-Wei Wu's latest patents is titled "Dummy Insertion for Improving Throughput of Electron Beam Lithography." This patent describes an electron beam lithography system and process designed to enhance throughput. The method involves receiving an integrated circuit (IC) design layout that includes a target pattern. The electron beam lithography system first implements a specific exposure dose to form the target pattern on a workpiece based on the IC design layout. To increase the pattern density of the IC design layout, a dummy pattern is inserted, generating a modified IC design layout. Subsequently, the system implements a second exposure dose, which is less than the first, to form the target pattern on the workpiece based on the modified layout.

Career Highlights

Hsin-Wei Wu has established himself as a key figure in the semiconductor industry through his work at Taiwan Semiconductor Manufacturing Company Limited. His expertise in electron beam lithography has led to advancements that benefit the manufacturing processes of integrated circuits.

Collaborations

Hsin-Wei Wu has collaborated with notable colleagues, including Chun-Feng Nieh and Tsun-Jen Chan. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the field.

Conclusion

Hsin-Wei Wu's contributions to electron beam lithography exemplify the impact of innovative thinking in the semiconductor industry. His patents and collaborative efforts continue to drive advancements in manufacturing processes, showcasing the importance of innovation in technology.