This inventor holds 3 USPTO granted patents. Top assignee: United Microelectronics Corp.. Active years: 2011-2017.
Location History:
- Pingtung, TW (2011)
- Tainan, TW (2013)
- Ping-Tung County, TW (2017)
Company Filing History:
Years Active: 2011-2017
Title: Hsin-Hsing Chen: Innovator in Semiconductor Technology
Introduction
Hsin-Hsing Chen is a prominent inventor based in Pingtung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.
Latest Patents
One of Hsin-Hsing Chen's latest patents is titled "Semiconductor device having bilayer metal layer." This invention describes a semiconductor device that includes an opening, a metal nitride layer, a bilayer metal layer, and a conductive bulk layer. The opening is disposed in a first dielectric layer, with the metal nitride layer positioned within the opening. The bilayer metal layer, consisting of a first metal layer and a second metal layer with a higher metal concentration, is placed on the metal nitride layer. The conductive bulk layer fills the opening, enhancing the device's functionality.
Another notable patent is the "Stress film forming method and stress film structure." This method is utilized in the fabrication process of semiconductor devices. It begins with a substrate where both a first-polarity-channel MOSFET and a second-polarity-channel MOSFET are formed. A deposition-curing cycle process is then performed to create a cured stress film over both MOSFETs. Following this, an additional deposition process forms a non-cured stress film on the cured stress film, resulting in a seamless stress film that improves device performance.
Career Highlights
Hsin-Hsing Chen is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to develop innovative solutions that address the challenges faced in semiconductor manufacturing.
Collaborations
Throughout his career, Hsin-Hsing Chen has collaborated with notable colleagues, including Chih-Chun Wang and Chih-Yueh Li. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Hsin-Hsing Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor devices, showcasing the importance of innovation in technology.