Hsin-Chen Cheng

Title: Hsin-Chen Cheng: Innovator in Semiconductor Technology

Introduction

Hsin-Chen Cheng is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative work focuses on improving processes and methods in semiconductor manufacturing.

Latest Patents

One of Hsin-Chen Cheng's latest patents is titled "Wet bench and chemical treatment method using the same." This method involves introducing a chemical liquid into an inner tank, reacting it with a wafer to generate byproducts, and managing the overflow to an outer tank designed with specific structural features for effective filtering. Another notable patent is "Methods for improvement of photoresist patterning profile." This method outlines a process for forming a semiconductor structure, including the application of a cleaning solution and the formation of a patterned photoresist layer to enhance the semiconductor's performance.

Career Highlights

Hsin-Chen Cheng is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has allowed him to develop and refine innovative techniques that contribute to the advancement of the industry.

Collaborations

Throughout his career, Hsin-Chen Cheng has collaborated with notable colleagues, including Ke-Ming Chen and Ting-Jung Chang. These partnerships have fostered a collaborative environment that enhances the innovation process.

Conclusion

Hsin-Chen Cheng's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.