The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Jun. 28, 2019
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventor:

Hsin-Chen Cheng, Taichung, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67086 (2013.01); H01L 21/67057 (2013.01);
Abstract

A wet bench includes an outer tank and an inner tank. The outer tank has a first base plate and a plurality of first sidewalls defining a first containing space. A first portion of the first base plate is higher than a second portion of the first base plate. The inner tank has a portion in the first containing space and extends through the first base plate of the outer tank. The inner tank has a second base plate and a plurality of second sidewalls defining a second containing space.


Find Patent Forward Citations

Cheng, Hsin-Chen. (2022). Wet bench and chemical treatment method using the same (U.S. Patent No. 11532493). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11532493

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…