The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2025

Filed:

Jul. 22, 2022
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventor:

Hsin-Chen Cheng, Taichung, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B05D 1/18 (2006.01); B08B 3/08 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67086 (2013.01); B05D 1/18 (2013.01); B08B 3/08 (2013.01); H01L 21/306 (2013.01); H01L 21/67057 (2013.01);
Abstract

A method includes introducing a chemical liquid into the inner tank; reacting the wafer with the chemical liquid to generate byproducts; overfilling the inner tank with the chemical liquid and the byproducts from the inner tank to an outer tank, wherein the outer tank has an upper inclined bottom plate, a lower flat bottom plate, and a vertical intermediary bottom plate connecting the upper inclined bottom plate to the lower flat bottom plate, the inner tank penetrates through the upper inclined bottom plate of the outer tank; introducing the chemical liquid with the byproducts from above the lower flat bottom plate of the outer tank to a filter; filtering out the byproducts out of the chemical liquid by using the filter; introducing the filtered chemical liquid to the inner tank.


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