IDiyas

For the Inventor, By the Inventor

Keelung, Taiwan

Hsiang-Chih Hsiao

USPTO Granted Patents = 11

Average Co-Inventor Count = 5.6

ph-index = 3

Forward Citations = 17(Granted Patents)


Location History:

  • Hsinchu, TW (2012 - 2014)
  • Keelung, TW (2009 - 2016)

Company Filing History:

goldMedal11 out of 4,573 
 
Au Optronics Corporation
 patents

Years Active: 2009-2016

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11 patents (USPTO):Explore Patents
1. 9341950 - Method of forming patterned layer, method of forming patterned photoresist layer, and active device array substrate (2016-05-17),
2. 9122162 - Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer (2015-09-01),
3. 8669558 - Pixel structure and electrical bridging structure (2014-03-11),
4. 8530144 - Photomask and method for fabricating source/drain electrode of thin film transistor (2013-09-10),
5. 8427631 - Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer (2013-04-23),
6. 8377766 - Method of making thin film transistor (2013-02-19),
7. 8153337 - Photomask and method for fabricating source/drain electrode of thin film transistor (2012-04-10),
8. 7989243 - Method for fabricating pixel structure (2011-08-02),
9. 7749821 - Method of fabricating pixel structure (2010-07-06),
10. 7645649 - Method for fabricating pixel structure (2010-01-12),
11. 7598102 - Method for fabricating pixel structure (2009-10-06),

Title: Hsiang-Chih Hsiao: Innovator in Exposure Apparatus Technology

Introduction

Hsiang-Chih Hsiao is a prominent inventor based in Keelung, Taiwan. He has made significant contributions to the field of exposure apparatus technology, holding a total of 11 patents. His innovative work has advanced the methods used in forming patterned layers and photoresist layers, which are crucial in various applications.

Latest Patents

Hsiang-Chih Hsiao's latest patents include a method of forming a patterned layer, a method of forming a patterned photoresist layer, and an active device array substrate. One of his notable inventions is an exposure apparatus designed for exposing a photoresist layer on a substrate to create multiple strip exposed patterns. This apparatus features a light source, a lens group, and a mask. The lens group consists of several strip lenses arranged parallel to one another, with overlapping regions defined as lens connecting regions. The mask contains shielding patterns that correspond to the strip exposed patterns, each with strip openings aligned parallel to the shielding patterns.

Career Highlights

Hsiang-Chih Hsiao is currently employed at AU Optronics Corporation, where he continues to develop innovative technologies in the field of optics and exposure systems. His work has been instrumental in enhancing the efficiency and precision of exposure processes in various applications.

Collaborations

Hsiang-Chih Hsiao has collaborated with notable colleagues, including Ta-Wen Liao and Chia-Ming Chang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hsiang-Chih Hsiao's contributions to exposure apparatus technology and his impressive portfolio of patents highlight his role as a leading inventor in his field. His work continues to influence advancements in technology and manufacturing processes.

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