The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2013
Filed:
Mar. 03, 2010
Applicants:
Chia-ming Chang, Hsin-Chu, TW;
Hsiang-chih Hsiao, Hsin-Chu, TW;
Inventors:
Chia-Ming Chang, Hsin-Chu, TW;
Hsiang-Chih Hsiao, Hsin-Chu, TW;
Assignee:
AU Optronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photo-mask includes a first opaque pattern, a second opaque pattern, a transparent single slit, and a translucent pattern. The transparent single slit is disposed between the first opaque pattern and the second opaque pattern, and the width of the transparent single slit is substantially between 1.5 micrometers and 2.5 micrometers. The translucent pattern is connected to the first opaque pattern and the second opaque pattern.