San Jose, CA, United States of America

Hongqin Shi

USPTO Granted Patents = 23 

 

Average Co-Inventor Count = 3.5

ph-index = 6

Forward Citations = 223(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2005 - 2006)
  • Mountain View, CA (US) (2016)
  • San Jose, CA (US) (2004 - 2024)

Company Filing History:


Years Active: 2004-2024

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23 patents (USPTO):Explore Patents

Title: The Innovative Journey of Hongqin Shi

Introduction

Hongqin Shi, an accomplished inventor based in San Jose, CA, has made significant contributions to the field of lithography. With a remarkable portfolio of 23 patents, she has demonstrated her prowess in developing innovative technologies that push the boundaries of what is possible in the realm of semiconductor manufacturing.

Latest Patents

One of her latest patents is focused on "Systems and methods for contact immersion lithography." This innovative application relates to exposure units and methodologies for contact immersion lithography. The design includes a container that holds a fluid material and a substrate situated within it. The substrate features a first and a second surface, and it is coated with a photoresist material on at least the first surface. Additionally, it incorporates a photomask that is optically connected to the photoresist via a fluid gap. A key feature of this design is the inflatable balloon, which can be controlled to apply a specific force to the substrate's second surface, allowing for precise adjustments in the gap between the photomask and the photoresist material.

Career Highlights

Hongqin Shi has worked with notable companies such as Texas Instruments and Reflectivity, Inc., where she honed her skills and contributed to groundbreaking projects. Her engineering expertise and inventive spirit have established her as a leading figure in her field, earning her multiple patents showcasing her significant advancements in lithography techniques.

Collaborations

Throughout her career, Hongqin has collaborated with talented individuals, including James C. Dunphy and Satyadev R. Patel. These partnerships have not only enriched her projects but have also contributed to the development of innovative solutions in their respective fields.

Conclusion

Hongqin Shi’s contributions to the field of lithography through her patents and collaborations highlight her innovative spirit and technical expertise. With 23 patents to her name, she continues to shape the future of semiconductor technology and inspire the next generation of inventors.

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