The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2022
Filed:
Nov. 30, 2020
Waymo Llc, Mountain View, CA (US);
James Dunphy, San Jose, CA (US);
Hongqin Shi, San Jose, CA (US);
David Hutchison, Santa Clara, CA (US);
Yeh-Jiun Tung, Sunnyvale, CA (US);
Eric Copenhaver, Mountain View, CA (US);
Nao Chuei, San Mateo, CA (US);
Waymo LLC, Mountain View, CA (US);
Abstract
The present application relates to contact immersion lithography systems and methods of their use. An example immersion lithography system includes a photomask substrate and at least one sensor disposed along a surface of the photomask substrate. The immersion lithography system also includes a controller having at least one processor and a memory. The at least one processor is configured to execute program instructions stored in the memory so as to carry out operations. The operations include receiving, from the at least one sensor, information indicative of an electric field proximate to the at least one sensor. The operations also include determining, based on the received information, at least one of: a thickness of a liquid layer adjacent to the photomask substrate or a distance to a further substrate adjacent to the photomask substrate.