Eric Copenhaver

Title: Eric Copenhaver: Innovator in Photomask Cleanliness Verification

Introduction

Eric Copenhaver is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of lithography, particularly in the verification of photomask cleanliness. His innovative work is essential for advancing the technology used in semiconductor manufacturing.

Latest Patents

Copenhaver holds a patent titled "Systems and methods for verifying photomask cleanliness." This patent relates to contact immersion lithography systems and methods of their use. The immersion lithography system includes a photomask substrate and at least one sensor disposed along the surface of the photomask substrate. The system also features a controller with at least one processor and memory. The processor executes program instructions to carry out operations, which include receiving information from the sensor indicative of an electric field near the sensor. Based on this information, the system can determine the thickness of a liquid layer adjacent to the photomask substrate or the distance to a further substrate.

Career Highlights

Copenhaver is currently employed at Waymo LLC, where he applies his expertise in photomask cleanliness verification. His work is crucial in ensuring the precision and reliability of lithography processes in the production of semiconductors.

Collaborations

Throughout his career, Copenhaver has collaborated with notable colleagues, including James C Dunphy and Hongqin Shi. These collaborations have contributed to the advancement of technologies in the field of lithography.

Conclusion

Eric Copenhaver's innovative contributions to photomask cleanliness verification highlight his importance in the semiconductor industry. His patent and work at Waymo LLC demonstrate his commitment to advancing lithography technology.