Hsinchu, Taiwan

Hong-Chang Hsieh

This inventor holds 4 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2001-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hong-Chang Hsieh. Retrieved from https://idiyas.com/inventor/hong-chang-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2001-2011

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4 patents (USPTO):Explore Patents

Title: The Innovative Journey of Hong-Chang Hsieh

Introduction:

Hong-Chang Hsieh, a distinguished inventor hailing from Hsin-Chu, Taiwan, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents:

Hong-Chang Hsieh's latest patents include cutting-edge technologies in the semiconductor industry, particularly focusing on advancements in nanotechnology and microelectronics.

Career Highlights:

Throughout his illustrious career, Hsieh has been at the forefront of innovation, holding numerous patents that have revolutionized the way we perceive and utilize technology. His work has not only garnered international recognition but has also paved the way for future technological advancements.

Collaborations:

Hsieh has collaborated with leading research institutions, universities, and tech companies to further his research and bring his inventions to life. His collaborative efforts have resulted in the development of groundbreaking technologies that have had a lasting impact on the industry.

Conclusion:

In conclusion, Hong-Chang Hsieh's dedication to innovation and his relentless pursuit of technological advancement have solidified his position as a trailblazer in the world of inventions. His work continues to inspire future generations of inventors and serves as a testament to the power of innovation in shaping our world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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