The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2008
Filed:
Oct. 05, 2005
Shih-ming Chang, Hsin-Chu, TW;
Chen-yuan Hsia, Hsinchu, TW;
Wen-chuan Wang, Taipei, TW;
Chi-lun LU, Hsinchu, TW;
Yen-bin Huang, Hsinchu, TW;
Chang-cheng Hung, Jhubei, TW;
Chia-jen Chen, Jhudong Township, Hsinchu County, TW;
Kai-chung Liu, Industrial Park, TW;
Hsin-chang Lee, Zhubei, TW;
Hong-chang Hsieh, Hsin-Chu, TW;
Shih-Ming Chang, Hsin-Chu, TW;
Chen-Yuan Hsia, Hsinchu, TW;
Wen-Chuan Wang, Taipei, TW;
Chi-Lun Lu, Hsinchu, TW;
Yen-Bin Huang, Hsinchu, TW;
Chang-Cheng Hung, Jhubei, TW;
Chia-Jen Chen, Jhudong Township, Hsinchu County, TW;
Kai-Chung Liu, Industrial Park, TW;
Hsin-Chang Lee, Zhubei, TW;
Hong-Chang Hsieh, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Co., Hsin-Chu, TW;
Abstract
A system and method are disclosed for monitoring a dimensional change of a pattern for an object having a transparent layer exposed through the pattern and a non-transparent pattern laminated therewith. According to the method, a first beam is projected to the pattern. A second beam resulted from the first beam passing through the transparent layer exposed by the pattern, or from the first beam reflected from the non-transparent layer of the pattern, is detected. A value of a predetermined property from the second beam detected is obtained. A variation of the value is monitored for identifying the dimensional change of the pattern.