Chi-Lun Lu

This inventor holds 39 USPTO granted patents and 4 published patent applications, primarily in EUV Lithography. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2006-2025.

USPTO Granted Patents = 39 (Patent Applications = 4)

% Patents Active = 53.8

Average Co-Inventor Count = 4.2

ph-index = 5

Forward Citations = 71(Granted Patents)

Location History:

Changhua, TW (2008 - 2011)
Hsinchu, TW (2006 - 2023)

Company Filing History:

39 out of 42,711

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

Years Active: 2006-2025

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Areas of Expertise:

EUV Lithography

Photomask Cleaning

Patterning Method

Durability

Particle Removal

Cleaning Module

Holographic Reticle

Dimension Monitoring

Critical Dimension Control

Etching Bias Reduction

Plasma Control

Device Manufacturing

39 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12493237 - EUV pellicle and mounting method thereof on photo mask (2025-12-09),

2. 12353120 - EUV photo masks and manufacturing method thereof (2025-07-08),

3. 12276906 - Methods for cleaning lithography mask (2025-04-14),

4. 11822230 - EUV pellicle and mounting method thereof on photo mask (2023-11-21),

5. 11378894 - Lithography system with an embedded cleaning module (2022-07-05),

6. 11079669 - System and method for localized EUV pellicle glue removal (2021-08-03),

7. 11003069 - High durability extreme ultraviolet photomask (2021-05-11),

8. 10642148 - High durability extreme ultraviolet photomask (2020-05-05),

9. 10520805 - System and method for localized EUV pellicle glue removal (2019-12-31),

10. 10459353 - Lithography system with an embedded cleaning module (2019-10-29),

11. 10156784 - Systems and methods of EUV mask cleaning (2018-12-18),

12. 10067418 - Particle removal system and method thereof (2018-09-04),

13. 10061191 - High durability extreme ultraviolet photomask (2018-08-28),

14. 9889477 - Method and apparatus for enhanced cleaning and inspection (2018-02-13),

15. 9885952 - Systems and methods of EUV mask cleaning (2018-02-06),

Title: The Innovative Journey of Inventor Chi-Lun Lu

Introduction:

Chi-Lun Lu, a distinguished inventor hailing from Hsinchu, Taiwan, has made significant contributions to the field of technology through his groundbreaking innovations and patents.

Latest Patents:

Chi-Lun Lu's latest patents include advancements in semiconductor technology, renewable energy solutions, and artificial intelligence systems, showcasing his versatility and forward-thinking approach to invention.

Career Highlights:

With a career spanning over two decades, Chi-Lun Lu has held key positions in leading tech companies, where he spearheaded research and development projects that have resulted in numerous successful patents. His expertise in areas such as nanotechnology and telecommunications has earned him recognition as a pioneer in the industry.

Collaborations:

Throughout his career, Chi-Lun Lu has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and knowledge-sharing. His collaborative efforts have led to the development of cutting-edge technologies that have had a lasting impact on various sectors.

Conclusion:

Inventor Chi-Lun Lu's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his reputation as a visionary in the field. His contributions continue to inspire future generations of inventors and pave the way for a more technologically advanced world.