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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9889477 B1

PDFFull Text
Date of Patent:
Feb. 13, 2018

Filed:

Sep. 17, 2015

Method and apparatus for enhanced cleaning and inspection

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chi-Lun Lu, Hsinchu, TW;

Sheng-Chi Chin, Hsinchu, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsin-Chu, TW;

Attorney:

Haynes and Boone, LLP

Primary Examiner:

Saeed T Chaudhry

Int. Cl.
CPC ...
B08B 5/00 (2006.01); B08B 6/00 (2006.01); B08B 7/02 (2006.01); H01L 21/12 (2006.01); G03F 1/82 (2012.01); B05C 13/00 (2006.01); B05C 11/02 (2006.01); A47L 13/40 (2006.01); B05C 13/02 (2006.01); B08B 5/02 (2006.01); B08B 7/00 (2006.01); H01L 21/67 (2006.01); H01L 21/673 (2006.01); H01L 21/02 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
B08B 5/00 (2013.01); A47L 13/40 (2013.01); B05C 11/02 (2013.01); B05C 13/02 (2013.01); B08B 5/02 (2013.01); B08B 6/00 (2013.01); B08B 7/0057 (2013.01); B08B 7/02 (2013.01); B08B 7/028 (2013.01); G03F 1/82 (2013.01); H01L 21/0206 (2013.01); H01L 21/67028 (2013.01); H01L 21/67359 (2013.01); H01L 22/12 (2013.01);
Abstract

A cleaning and inspection system includes a cleaning chamber and retaining structure disposed within the cleaning chamber and configured to secure an article to be cleaned within the cleaning chamber. The cleaning and inspection system also includes a gas distributor disposed within the cleaning chamber and configured to distribute a turbulent flow of gas into the cleaning chamber that facilitates removal of foreign particles from a surface of the article. Further, the system includes a particle collection surface positioned to collect foreign particles removed from the surface of the article.

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