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Hsinchu, Taiwan

Sheng-Chi Chin

USPTO Granted Patents = 45 (Patent Applications = 1)

Average Co-Inventor Count = 4.1

ph-index = 6

Forward Citations = 289(Granted Patents)

Location History:

Jhubei, TW (2013 - 2014)
Hsin-Chu, TW (2002 - 2023)

Company Filing History:

45 out of 40,780

Taiwan Semiconductor Manufacturing Comp. Ltd.

Years Active: 2002-2025

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Areas of Expertise:

Lithography Method

EUV Pellicle

Acoustic Measurement

Mask Fabrication

Holographic Reticle

Defect Inspection

Particle Removal

Photomask Fabrication

Device Manufacturing

Etching Bias Reduction

Mask Critical Dimension Uniformity

Focused Radiation Beam Deposition

45 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12429776 - Lithography method with reduced impacts of mask defects (2025-09-30),

2. 12320782 - Acoustic measurement of fabrication equipment clearance (2025-06-03),

3. 11709153 - Acoustic measurement of fabrication equipment clearance (2023-07-25),

4. 11079669 - System and method for localized EUV pellicle glue removal (2021-08-03),

5. 10955746 - Lithography method with reduced impacts of mask defects (2021-03-23),

6. 10859908 - Method to fabricate mask-pellicle system (2020-12-08),

7. 10845342 - Acoustic measurement of film thickness (2020-11-24),

8. 10794872 - Acoustic measurement of fabrication equipment clearance (2020-10-06),

9. 10691017 - Pellicle for advanced lithography (2020-06-23),

10. 10520805 - System and method for localized EUV pellicle glue removal (2019-12-31),

11. 10126644 - Pellicle for advanced lithography (2018-11-13),

12. 10061193 - Focused radiation beam induced deposition (2018-08-28),

13. 9933699 - Pellicle aging estimation and particle removal from pellicle via acoustic waves (2018-04-03),

14. 9915866 - Focused radiation beam induced deposition (2018-03-13),

15. 9910350 - Method for repairing a mask (2018-03-06),

Title: The Innovative Journey of Sheng-Chi Chin

Introduction: Sheng-Chi Chin, a pioneering inventor hailing from Hsinchu, Taiwan, has made significant contributions to the field of technology and innovation.

Latest Patents: Sheng-Chi Chin's latest patents focus on advancements in semiconductor technology, particularly in the development of cutting-edge microchips for various applications.

Career Highlights: With a career spanning over two decades, Sheng-Chi Chin has worked tirelessly to push the boundaries of technological innovation. His work has been instrumental in shaping the landscape of the semiconductor industry.

Collaborations: Throughout his career, Sheng-Chi Chin has collaborated with leading tech companies and research institutions to further his research and bring his inventions to life. His collaborative spirit has been key to the success of many groundbreaking projects.

Conclusion: Sheng-Chi Chin's relentless pursuit of innovation and his dedication to pushing the boundaries of technology make him a true trailblazer in the world of inventors. His work continues to inspire and shape the future of the semiconductor industry.

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