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For the Inventor, By the Inventor

Kanagawa, Japan

Hisayoshi Yamoto

USPTO Granted Patents = 26 

Average Co-Inventor Count = 3.2

ph-index = 15

Forward Citations = 619(Granted Patents)


Location History:

  • Hatano, JA (1977)
  • Hatano, JP (1979)
  • Atsugi, JP (1981)
  • Kanagawa, JP (1987 - 2006)

Company Filing History:

goldMedal26 out of 58,129 
 
Sony Corporation
 patents

Years Active: 1977-2006

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26 patents (USPTO):Explore Patents
1. 7098085 - Method and apparatus for forming a thin semiconductor film, method and apparatus for producing a semiconductor device, and electro-optical apparatus (2006-08-29),
2. 7095082 - Electrooptical device, substrate for driving electrooptical device and methods for making the same (2006-08-22),
3. 6825070 - Electro-optical apparatus, driving substrate for an electro-optical apparatus and method of manufacturing them (2004-11-30),
4. 6767755 - Method of producing electrooptical device and method of producing driving substrate for driving electrooptical device (2004-07-27),
5. 6709512 - Method of growing a polycrystalline silicon layer, method of growing a single crystal silicon layer and catalytic CVD apparatus (2004-03-23),
6. 6653212 - Method and apparatus for thin-film deposition, and method of manufacturing thin-film semiconductor device (2003-11-25),
7. 6645835 - Semiconductor film forming method and manufacturing method for semiconductor devices thereof (2003-11-11),
8. 6521525 - Electro-optic device, drive substrate for electro-optic device and method of manufacturing the same (2003-02-18),
9. 6504215 - Electro-optical apparatus having a display section and a peripheral driving circuit section (2003-01-07),
10. 6500256 - Single crystal silicon layer, its epitaxial growth method and semiconductor device (2002-12-31),
11. 6492190 - Method of producing electrooptical device and method of producing driving substrate for driving electrooptical device (2002-12-10),
12. 6399429 - Method of forming monocrystalline silicon layer, method for manufacturing semiconductor device, and semiconductor device (2002-06-04),
13. 6376340 - Methods for forming polycrystalline silicon film (2002-04-23),
14. 6372558 - Electrooptic device, driving substrate for electrooptic device, and method of manufacturing the device and substrate (2002-04-16),
15. 6355952 - Capacitor having ferroelectric film and multiple layers of insulating and protective films for nonvolatile memory cell (2002-03-12),

Innovative Contributions of Hisayoshi Yamoto in Semiconductor Technology

Introduction

Hisayoshi Yamoto is a prominent inventor based in Kanagawa, Japan, known for his significant advancements in semiconductor technology. With a remarkable portfolio of 26 patents, Yamoto has made substantial contributions to the development of methods and apparatuses for efficient semiconductor production.

Latest Patents

Yamoto's latest innovations include a method and apparatus for forming thin semiconductor films, a method and apparatus for producing semiconductor devices, and a groundbreaking electro-optical apparatus. The focus of these patents lies in developing high-quality, high-crystallinity polycrystalline or monocrystalline thin semiconductor films. The inventive method allows for low-cost, large-area semiconductor film formation, involving the initial creation of a low-crystal-quality thin semiconductor film followed by focused-light annealing, improving crystallization during cooling. Furthermore, Yamoto has introduced innovative designs for electro-optical devices and their driving substrates, which are integral to modern display technologies.

Career Highlights

Throughout his career, Yamoto has been associated with Sony Corporation, a leading technology company renowned for its contributions to consumer electronics and digital innovation. His pioneering work in the semiconductor field has placed him among the notable inventors in the industry.

Collaborations

Yamoto collaborates with esteemed colleagues, including Hideo Yamanaka and Hajime Yagi, contributing to a collaborative environment that fosters innovative solutions and enhances the research and development processes within the company.

Conclusion

Hisayoshi Yamoto's inventions and patents not only reflect his ingenuity but also contribute significantly to the advancement of semiconductor technology. As he continues to innovate, his work will undoubtedly have lasting effects on the industry and pave the way for further groundbreaking developments.

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