The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2003
Filed:
Mar. 16, 2000
Hisayoshi Yamoto, Kanagawa, JP;
Hideo Yamanaka, Kanagawa, JP;
Hajime Yagi, Tokyo, JP;
Yuuichi Sato, Kanagawa, JP;
Sony Corporation, , JP;
Abstract
A method for forming a semiconductor film capable allowing easy cleaning of the processing equipment and capable of forming an epitaxial film at low temperatures as well as a manufacturing method for semiconductor devices utilizing this forming method is needed for achieving selective crystalline growth on semiconductor film. The forming method comprises a process for forming a mask having an aperture exposing a substrate surface on substrate, and a process for forming a semiconductor film by selective crystalline growth on a semiconductor piece by means of catalytic chemical vapor deposition on a substrate surface exposed by an aperture on a mask; as well as a manufacturing method for semiconductor devices utilizing the semiconductor film forming method.