The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2003

Filed:

Apr. 09, 2001
Applicant:
Inventors:

Hideo Yamanaka, Kanagawa, JP;

Hisayoshi Yamoto, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/120 ; C23C 1/600 ;
U.S. Cl.
CPC ...
H01L 2/120 ; C23C 1/600 ;
Abstract

A thin film forming apparatus S having a vacuum chamber , a substrate , a thermal catalyst , and a heating means for heating this thermal catalyst , wherein a gas introduction system for feeding the gas is connected in the vacuum chamber , the gas is fed from this gas introduction system to the vacuum chamber , and thin films are formed on the surface of the substrate by utilizing a thermal decomposition reaction or catalytic reaction by the thermal catalyst , the gas introduction system is for introducing a carrier gas containing hydrogen and a material gas for forming the thin film on the substrate , and the carrier gas is constantly fed into the vacuum chamber at least during the formation of the thin film.


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