Hisato Shinohara

Title: **Innovations by Hisato Shinohara: A Pioneer in Plasma CVD Technology**

Introduction

Hisato Shinohara, based in Yamanashi, Japan, is a renowned inventor with an impressive portfolio encompassing 22 patents. His contributions mainly focus on advancements in plasma chemical vapor deposition (CVD) technology, which are pivotal for various applications in the semiconductor and flexible electronics industries.

Latest Patents

Shinohara's latest innovations include the Plasma CVD device and discharge electrode, designed to enhance the film formation process. This device strategically rectifies the gas flow introduced into the film formation chamber, directing it away from the substrate's film formation surface. This innovative design effectively exhausts fine particles and fragmental particles generated within the discharge space, thus preventing contamination that can affect the substrate's surface quality. The multiple apertures across the discharge electrode facilitate the removal of these particles, establishing a steady state of film deposition and enabling continuous operation without the need for frequent cleaning.

Another significant patent by Shinohara involves a conveyor device and film formation apparatus for flexible substrates. This apparatus overcomes the limitations of the conventional cylindrical can method, allowing for a more compact and efficient design. It features a mechanism capable of continuously conveying flexible substrates through a series of cylindrical rollers, ensuring consistent contact and uniform substrate handling throughout the film formation process.

Career Highlights

Shinohara's career has been marked by his roles in prominent companies such as Semiconductor Energy Laboratory Co., Ltd. and TDK Corporation. His work in these organizations has been influential in shaping cutting-edge technologies that support the electronics industry, particularly in semiconductor fabrication.

Collaborations

Throughout his career, Shinohara has collaborated with notable colleagues, including Yasuyuki Arai and Masato Yonezawa. These partnerships have likely contributed to the innovation and development of his patents, leveraging diverse expertise to enhance technology in the field.

Conclusion

Hisato Shinohara's contributions to plasma CVD technology and flexible substrate processing have established him as a leading figure in the field of invention. With 22 patents to his name, he continues to influence the landscape of semiconductor and electronics manufacturing, paving the way for future innovations. His ongoing research and developments serve as a testament to his dedication and ingenuity as an inventor.