The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2003
Filed:
Mar. 19, 2001
Other;
Abstract
In the substrate treatment apparatus including substrate treatment chambers ( and ) and a buffer chamber ( ) having an exhaust system ( ) independent of the substrate treatment chambers, connection tubes ( and ) are provided between the substrate treatment chambers and the buffer chamber, and gas inlets are respectively provided for the connection tubes. A gas ( ) for treating a substrate flows from the connection tube ( ) into the substrate treatment chamber ( ) and the buffer chamber ( ), while a gas ( ) for treating a substrate flows from the connection tube ( ) into the substrate treatment chamber ( ) and the buffer chamber ( ). Accordingly, the gas does not move from the substrate treatment chamber to the buffer chamber against a gas flow, thereby allowing the separation between ambiences.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile