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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7095090 B1

PDFFull Text
Expired
Date of Patent:
Aug. 22, 2006

Filed:

Apr. 12, 2004

Photoelectric conversion device

Applicants:

Setsuo Nakajima, Atsugi, JP;

Yasuyuki Arai, Atsugi, JP;

Hisato Shinohara, Sagamihara, JP;

Masayoshi Abe, Tama, JP;

Inventors:

Setsuo Nakajima, Atsugi, JP;

Yasuyuki Arai, Atsugi, JP;

Hisato Shinohara, Sagamihara, JP;

Masayoshi Abe, Tama, JP;

Assignees:

Semiconductor Energy Laboratory Co., Ltd., Kanagawa-ken, JP;

TDK Corporation, Chuo-ku, JP;

Attorneys:

Eric J. Robinson

Robinson Intellectual Property Law Office, P.C.

Primary Examiner:

Hoai Pham

Int. Cl.
CPC ...
H01L 31/0203 (2006.01);
U.S. Cl.
CPC ...
Abstract

A photoelectric conversion device taking the form of a thin film and having a substrate exhibiting poor thermal resistance. The device prevents thermal deformation which would normally be caused by local application of excessive heat to the substrate. The device has output terminals permitting the output from the device to be taken out. The output terminals are formed on the surface of the substrate opposite to the photoelectric conversion device. The device further includes electrical connector portions for electrically connecting the electrodes of the device with the output terminals. The present invention also provides a method of treating a substrate having poor thermal resistance with a plasma with a high throughput. The substrate is continuously supplied into a reaction chamber and treated with a plasma. This supply operation is carried out in such a way that the total length of the substrate existing in a plasma processing region formed by electrodes is longer than the length of the electrodes.

Find Patent Forward Citations

Nakajima, Setsuo. (2006). Photoelectric conversion device (U.S. Patent No. 7095090). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7095090

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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