The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2000
Filed:
Dec. 10, 1998
Applicant:
Inventors:
Hisato Shinohara, Kanagawa, JP;
Akira Sugawara, Kanagawa, JP;
Assignee:
Semiconductor Energy Laboratory Co., Ltd., Kanagawa-ken, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B23K / ;
U.S. Cl.
CPC ...
427596 ; 427554 ; 427582 ; 216 65 ; 216 94 ; 216 87 ; 21912175 ; 21912185 ;
Abstract
A method for treating an object with a laser including emitting a laser beam from a laser; expanding the laser beam in a first direction; removing a portion of the laser beam though a mask, the portion including at least edges of the expanded laser beam extending in the first direction; and condensing the laser beam in a second direction orthogonal to the first direction in order to form a line-shaped laser beam on an object.
Shinohara, Hisato. (2000). Method and system of laser processing (U.S. Patent No. 6149988). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6149988
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile