Location History:
- Ora-Gun, JP (2009)
- Gunma, JP (2007 - 2011)
Company Filing History:
4 out of 8,780 
1 out of 39 
1 out of 6 Years Active: 2007-2011
Title: The Innovative Contributions of Hisao Otsuka in Semiconductor Technology
Introduction
Hisao Otsuka, a notable inventor from Gunma, Japan, has made significant strides in semiconductor technology. Over the course of his career, Otsuka has been granted four patents, each reflecting his commitment to enhancing the efficiency and reliability of semiconductor devices.
Latest Patents
His recent innovations include a patent for a semiconductor device with a recess portion over a pad electrode. This patent outlines a manufacturing method designed to improve production yield and reliability by increasing the area of the semiconductor substrate bonded to a supporting body. By forming a window that exclusively exposes first wirings in the region where they exist, Otsuka's method effectively prevents cracks and substrate separation during dicing. Another patent focuses on creating a CSP (Chip Size Package) type semiconductor device that boasts high reliability. This invention includes a comprehensive structure of passivation films and plating layers, which not only ensures protection for the pad electrode but also enhances the overall integrity of the semiconductor device.
Career Highlights
Throughout his esteemed career, Hisao Otsuka has worked with prominent organizations, including Sanyo Electric Co., Ltd. and Kanto Sanyo Semiconductors Co., Ltd. His experience in these companies has undoubtedly contributed to his understanding and expertise in semiconductor manufacturing processes and technologies.
Collaborations
Otsuka has collaborated with talented coworkers such as Takashi Noma and Yukihiro Takao, working collectively to push the boundaries of semiconductor design and production. These collaborations have further enriched his innovative endeavors and have likely played a crucial role in the success of his inventions.
Conclusion
Hisao Otsuka's continuous innovations in semiconductor technology highlight his dedication to improving manufacturing processes and device reliability. With four patents to his name, his contributions are significant in driving advancements in the semiconductor industry, paving the way for future innovations in this vital field.