Tokyo, Japan

Hiroyuki Iwashita

This inventor holds 29 USPTO granted patents and 2 published patent applications, primarily in Photomask Technology. Top assignees: Hoya Corporation, Nec Corporation. Active years: 2004-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Iwashita. Retrieved from https://idiyas.com/inventor/hiroyuki-iwashita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 96.6

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 23(Granted Patents)


Location History:

  • Shinjuku-ku, JP (2012 - 2016)
  • Tokyo, JP (2004 - 2021)

Company Filing History:


Years Active: 2004-2021

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Areas of Expertise:
Photomask Blank
Phase Shift Mask
Semiconductor Device
Manufacturing Method
Transfer Mask
Color Image Processing
Image Processor
Photomask Production
Mask Blank
Production Method
29 patents (USPTO):Explore Patents

Title: Hiroyuki Iwashita: Innovator in Semiconductor Technology

Introduction

Hiroyuki Iwashita, based in Tokyo, Japan, is a prominent inventor with a remarkable portfolio of 29 patents. His innovations primarily focus on advancements in semiconductor technology, contributing significantly to the industry's evolution.

Latest Patents

Among his latest patents are groundbreaking advancements in mask technology. These include a mask blank and a phase shift mask, which facilitate the manufacturing of semiconductor devices. One noteworthy invention involves a mask blank that integrates a phase shift film with a transmittance of 20% or more, employing a complex stacked structure of low and high transmission layers. This innovative approach enhances the transmission of exposure light from ArF excimer lasers, showcasing Iwashita's expertise in material science and optics. Additionally, he developed a mask blank designed for producing transfer masks that enable efficient electron beam (EB) defect correction while minimizing the thickness of the light-shielding film.

Career Highlights

Hiroyuki Iwashita's career has been marked by significant contributions to leading corporations in the semiconductor field. He has worked for esteemed companies such as Hoya Corporation and NEC Corporation, where he has been influential in driving technological advancements and enhancing product performance. His patent portfolio reflects a deep understanding of semiconductor manufacturing processes and the challenges inherent to them.

Collaborations

Throughout his career, Iwashita has collaborated with notable professionals in the field, including Masahiro Hashimoto and Atsushi Kominato. These collaborations have helped foster innovation and advance semiconductor technologies, further solidifying his role as a key inventor in the industry.

Conclusion

Hiroyuki Iwashita's contributions to semiconductor technology through his patents and collaborations underscore his position as a leading inventor in the field. His work continues to shape the future of semiconductor manufacturing, paving the way for new innovations and improved processes. With a solid foundation of expertise and an impressive patent portfolio, Iwashita remains a pivotal figure in advancing technological boundaries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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