The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2014

Filed:

Apr. 01, 2013
Applicants:

Hiroyuki Iwashita, Tokyo, JP;

Atsushi Kominato, Tokyo, JP;

Masahiro Hashimoto, Tokyo, JP;

Hiroaki Shishido, Tokyo, JP;

Inventors:

Hiroyuki Iwashita, Tokyo, JP;

Atsushi Kominato, Tokyo, JP;

Masahiro Hashimoto, Tokyo, JP;

Hiroaki Shishido, Tokyo, JP;

Assignee:

Hoya Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/46 (2012.01); G03F 1/38 (2012.01); G03F 1/50 (2012.01); G03F 1/54 (2012.01);
U.S. Cl.
CPC ...
G03F 1/50 (2013.01); G03F 1/46 (2013.01); G03F 1/54 (2013.01);
Abstract

A photomask blank is for use in manufacturing a photomask to be applied with exposure light having a wavelength of 200 nm or less. The photomask blank has a light-transmitting substrate and a light-shielding film formed thereon. The light-shielding film has a light-shielding layer containing a transition metal and silicon and a front-surface antireflection layer formed contiguously on the light-shielding layer and made of a material containing at least one of oxygen and nitrogen. The light-shielding film has a front-surface reflectance of a predetermined value or less for the exposure light and has a property capable of controlling the change width of the front-surface reflectance at the exposure wavelength to be within 2% when the thickness of the front-surface antireflection layer changes in the range of 2 nm. The material of the front-surface antireflection layer having a refractive index n and an extinction coefficient k capable of achieving such property is selected.


Find Patent Forward Citations

Iwashita, Hiroyuki. (2014). Photomask blank, photomask, and methods of manufacturing the same (U.S. Patent No. 8865378). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8865378

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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