Hirotoshi Ise

Title: Hirotoshi Ise: Innovator in EUV Lithography Technology

Introduction

Hirotoshi Ise is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of lithography, particularly in the development of tools and methods for producing EUV mask blanks. With a total of 6 patents to his name, Ise's work is pivotal in advancing the technology used in semiconductor manufacturing.

Latest Patents

One of Ise's latest patents is a glass substrate-holding tool and method for producing an EUV mask blank. This innovative tool includes an electrostatic chuck and a mechanical chuck, designed to hold a glass substrate during the production of reflective mask blanks for EUV lithography. The electrostatic chuck applies a catching and holding force of at least 200 kgf, while the mechanical chuck ensures that the pressing force per unit area does not exceed 25 kgf/mm. Another notable patent involves a similar glass substrate-holding tool, which utilizes an electrostatic attractive force to attract the rear surface of the glass substrate in a non-contact manner, enhancing the precision of the manufacturing process.

Career Highlights

Hirotoshi Ise has worked with Asahi Glass Company, Limited, where he has honed his skills and expertise in the field of lithography. His innovative approaches have led to advancements that are crucial for the production of high-quality EUV mask blanks.

Collaborations

Ise has collaborated with notable colleagues such as Takahiro Mitsumori and Takeru Kinoshita. Their combined efforts have contributed to the development of cutting-edge technologies in the lithography sector.

Conclusion

Hirotoshi Ise's contributions to EUV lithography technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing, ensuring the ongoing evolution of this critical industry.