The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
May. 18, 2012
Takahiro Mitsumori, Chiyoda-ku, JP;
Hirotoshi Ise, Chiyoda-ku, JP;
Takeru Kinoshita, Chiyoda-ku, JP;
Takahiro Mitsumori, Chiyoda-ku, JP;
Hirotoshi Ise, Chiyoda-ku, JP;
Takeru Kinoshita, Chiyoda-ku, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
A glass substrate-holding tool, adapted to be employed during the production of a reflective mask blank for EUV lithography (EUVL), includes an electrostatic chuck and a supporting member. The chuck attracts a rear surface of a glass substrate in a non-contact manner by electrostatic attractive force. The supporting member partly supports the rear surface. An area ratio of a projected area of an active surface of the chuck for providing the electrostatic force to an area of a quality-guaranteed region of the rear surface is from 0.5 to 1.0. The active surface is apart from the rear surface by more than 20 μm. The supporting member is configured to support only a region including at least two of four sides defining an outer portion outside the quality-guaranteed region.