logo

For the Inventor, By the Inventor

Koshi-Machi, Japan

Hiroshi Shinya

USPTO Granted Patents = 13

Average Co-Inventor Count = 3.4

ph-index = 5

Forward Citations = 135(Granted Patents)


Location History:

  • Kofu, JP (1999)
  • Kumamoto, JP (2006)
  • Koshi-Machi, JP (2003 - 2007)
  • Koshi, JP (2010 - 2014)

Company Filing History:

goldMedal12 out of 10,326 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 1 
 
Toyota Electron Limited
 patent

Years Active: 1999-2014

Loading Chart...
13 patents (USPTO):Explore Patents
1. 8782918 - Heat processing apparatus and heat processing method (2014-07-22),
2. 8192796 - Substrate processing apparatus and substrate processing method (2012-06-05),
3. 7980003 - Heat processing apparatus and heat processing method (2011-07-19),
4. 7757626 - Substrate processing apparatus and substrate processing method (2010-07-20),
5. 7223945 - Substrate heating method, substrate heating system, and applying developing system (2007-05-29),
6. 7060939 - Substrate heating method, substrate heating system, and applying developing system (2006-06-13),
7. 7050710 - Thermal treatment equipment and thermal treatment method (2006-05-23),
8. 7024798 - Low-pressure dryer and low-pressure drying method (2006-04-11),
9. 6986214 - Low-pressure dryer and low-pressure drying method (2006-01-17),
10. 6796054 - Low-pressure dryer and low-pressure drying method (2004-09-28),
11. 6573031 - Apparatus and method of thermal processing and method of pattern formation (2003-06-03),
12. 5928390 - Vertical processing apparatus (1999-07-27),
13. 5876280 - Substrate treating system and substrate treating method (1999-03-02),

Title: Inventor Hiroshi Shinya: A Visionary in Heat Processing Technology

Introduction

Hiroshi Shinya is an accomplished inventor based in Koshi-Machi, Japan. With a remarkable portfolio that includes 13 patents, Shinya has made significant contributions to the field of heat processing technology.

Latest Patents

Shinya's latest inventions showcase his innovative approach to heat processing methods and apparatus. His patent for a "Heat Processing Apparatus and Heat Processing Method" introduces an advanced heating plate designed to optimize substrate heating. This apparatus incorporates a cover to create an efficient exhaust gas flow, while a downflow forming mechanism ensures uniform heat distribution across the substrate. Additionally, his invention features a control mechanism that allows for mode switching between heating with downflows and exhaust gas flows, enhancing processing efficiency.

Another notable patent, "Substrate Processing Apparatus and Substrate Processing Method," highlights Shinya's ingenuity further. This design includes a holding table with an integrated heater within a treatment container for planarization. By utilizing a vertically movable pressing plate, which intermittently applies pressure on the resist film, this invention efficiently planarizes and dries the coating film on the substrate while maintaining the substrate at a specified temperature.

Career Highlights

Throughout his career, Hiroshi Shinya has worked with prominent companies such as Tokyo Electron Limited and Toyota Electron Limited. His experience in leading-edge technology firms has allowed him to expand his knowledge and expertise in developing practical solutions in heat processing.

Collaborations

Shinya's work has also involved collaboration with respected colleagues, including Takahiro Kitano and Tomohide Minami. Their combined efforts have contributed to the advancement of technologies in their respective fields.

Conclusion

Hiroshi Shinya's innovative spirit and dedication to enhancing heat processing technology through his patents have positioned him as a key figure in the industry. His contributions continue to influence research and development, paving the way for future advancements in substrate processing technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…