The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 05, 2012

Filed:

May. 18, 2010
Applicants:

Hiroshi Shinya, Koshi, JP;

Shouichi Terada, Koshi, JP;

Tsuyoshi Mizuno, Koshi, JP;

Yukihiro Wakamoto, Kikuchi-gun, JP;

Inventors:

Hiroshi Shinya, Koshi, JP;

Shouichi Terada, Koshi, JP;

Tsuyoshi Mizuno, Koshi, JP;

Yukihiro Wakamoto, Kikuchi-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

In the present invention, a holding table incorporating a heater is provided, for example, in a treatment container of a planarization unit. A pressing plate having a lower surface formed flat is disposed above the holding table. The pressing plate is movable in the vertical direction and can lower to the holding table to press a resist film on the substrate from above. The pressing plate intermittently presses the upper surface of the resist film to planarize the upper surface while the heater is heating the substrate on the holding table at a predetermined temperature to dry the resist film. According to the present invention, a coating film applied on the substrate can be sufficiently planarized and dried.


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