This inventor holds 14 USPTO granted patents, primarily in Radiation-Sensitive Materials. Top assignees: Hoechst Japan Limited, Honda Giken Kogyo Kabushiki Kaisha, Clariant Ag. Active years: 1991-1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tokyo, JP (1991 - 1995)
- Kawagoe, JP (1997)
- Saitama, JP (1996 - 1998)
Company Filing History:
10 out of 66 
2 out of 10,092 
1 out of 1 
Years Active: 1991-1998
Areas of Expertise:
Title: The Innovative Mind of Hiroshi Okazaki
Introduction
Hiroshi Okazaki, a prolific inventor based in Saitama, Japan, has made significant contributions to the field of polymers and radiation-sensitive compositions. With a remarkable portfolio of 14 patents, Okazaki has demonstrated a keen ability to innovate and advance technology in various applications.
Latest Patents
Among his latest patents, Okazaki has developed “Acid-labile group protected hydroxystyrene polymers or copolymers.” This invention focuses on polymers that possess recurrent pendant groups such as 1-(2-methanecarbonyl oxyethoxy)ethoxy group and 1-(2-N-methylcarbamatoethoxy)ethoxy group. The resulting resist, which contains the polymer along with a photo acid generator, base, additives, and a solvent, has sensitivity to ultraviolet light, electron beams, and X-rays. During the irradiation process, an acid is generated in the exposed area, which catalytically deprotects the acid-labile group when post-exposure baking is applied. Ultimately, positive patterns are achieved after developing the resist using an alkaline solution.
Another notable patent he holds is for a “Radiation-sensitive composition containing plasticizer.” This composition features (a) a binder that is insoluble in water but can be swelled in an aqueous alkali solution, (b) a dissolution inhibitor made from either a poly(N,O-acetal) or a phenol compound, (c) a photosensitive compound that generates an acid upon exposure to active radiation, (d) a base that decomposes under active radiation, (e) a plasticizer, and (f) a solvent.
Career Highlights
Throughout his career, Hiroshi Okazaki has held notable positions in significant companies including Hoechst Japan Limited and Honda Giken Kogyo Kabushiki Kaisha. His work in these organizations has undoubtedly influenced the development of advanced materials and technologies.
Collaborations
Okazaki has collaborated with fellow innovators, including Yoshiaki Kinoshita and Seiya Masuda. These partnerships have likely contributed greatly to the successful outcomes of his projects and patents.
Conclusion
Hiroshi Okazaki's contributions to the field through his innovative patents showcase his commitment to advancing technology. His work, particularly in the area of radiation-sensitive compositions and polymers, showcases the importance of collaboration and the impactful nature of technological advancements in our modern world.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile