The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 1997
Filed:
Mar. 29, 1996
Takanori Kudo, Sayama, JP;
Seiya Masuda, Tokorozawa, JP;
Yoshiaki Kinoshita, Tokyo, JP;
Klaus Przybilla, Frankfurt, DE;
Natsumi Endo, Kawagoe, JP;
Natsumi Suehiro, Kawagoe, JP;
Hiroshi Okazaki, Kawagoe, JP;
Hoechst Japan Limited, Tokyo, JP;
Abstract
A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.