Klaus Juergen Przybilla

Title: Klaus Juergen Przybilla: Innovator in Radiation-Sensitive Materials

Introduction

Klaus Juergen Przybilla is a notable inventor based in Frankfurt-am-Main, Germany. He has made significant contributions to the field of radiation-sensitive materials, holding a total of 3 patents. His work has implications in various technological applications, particularly in the production of advanced materials.

Latest Patents

Przybilla's latest patents include a positive-working radiation-sensitive mixture, which outlines a process for producing a solution of a basic or non-basic sulfonium compound. This compound is characterized by its versatility, allowing for various alkyl, aryl, or heteroaryl groups. Another significant patent involves a pattern-forming material that includes photoacid and photobase generators. This material is designed to have a wide exposure latitude and minimizes dimensional changes in patterns due to exposure variations.

Career Highlights

Klaus Juergen Przybilla is currently associated with Hoechst Japan Limited, where he continues to innovate in the field of materials science. His expertise in radiation-sensitive materials has positioned him as a key figure in his industry.

Collaborations

Throughout his career, Przybilla has collaborated with notable colleagues, including Takanori Kudo and Seiya Masuda. These collaborations have further enhanced his research and development efforts.

Conclusion

Klaus Juergen Przybilla's contributions to the field of radiation-sensitive materials are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in this area.