The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1996
Filed:
Feb. 15, 1994
Klaus J Przybilla, Frankfurt, DE;
Takanori Kudo, Saitama, JP;
Seiya Masuda, Saitama, JP;
Yoshiaki Kinoshita, Saitama, JP;
Natumi Suehiro, Saitama, JP;
Munirathna Padmanaban, Saitama, JP;
Hiroshi Okazaki, Saitama, JP;
Hajime Endo, Saitama, JP;
Ralph Dammel, Flemington, NJ (US);
Georg Pawlowski, Wiesbaden, DE;
Hoechst Japan Limited, Tokyo, JP;
Abstract
A novel positive-working radiation-sensitive mixture having a high sensitivity to radiation in a short-wavelength UV region is provided which can be developed in an aqueous alkaline solution, has a stable acid latent image and is used for the production of a semiconductor. The mixture comprises, as indispensable components, a) a binder insoluble in water but soluble in an aqueous alkaline solution, b) a compound having at least one bond cleavable with an acid, c) a compound capable of producing an acid upon radiation, and d.sub.1) a basic ammonium compound or d.sub.2) a basic sulfonium compound.