Location History:
- Kawagoe, JP (1997)
- Saitama, JP (1997 - 1998)
Company Filing History:
Years Active: 1997-1998
Title: Natsumi Suehiro: A Pioneer in Radiation-Sensitive Innovations
Introduction
Natsumi Suehiro is a prominent inventor based in Saitama, Japan. She has made significant contributions to the field of radiation-sensitive materials, holding a total of six patents. Her work has been instrumental in advancing technologies that rely on precise chemical processes.
Latest Patents
Natsumi's latest patents include a positive-working radiation-sensitive mixture and a radiation-sensitive composition. The positive-working radiation-sensitive mixture involves a process for producing a solution of a basic or non-basic sulfonium compound, which is crucial for various applications in photolithography. The radiation-sensitive composition is a chemically amplified resist material that comprises several components, including a homopolymer or copolymer of hydroxystyrene, a dissolution inhibitor, and a photosensitive compound capable of generating an acid upon exposure. These innovations are vital for enhancing the performance and efficiency of radiation-sensitive applications.
Career Highlights
Natsumi Suehiro works at Hoechst Japan Limited, where she has been able to apply her expertise in developing advanced materials. Her career is marked by a commitment to innovation and excellence in her field. She has consistently contributed to the growth of her company through her inventive solutions.
Collaborations
Some of Natsumi's notable coworkers include Seiya Masuda and Yoshiaki Kinoshita. Their collaborative efforts have further enriched the research environment at Hoechst Japan Limited, fostering a culture of innovation.
Conclusion
Natsumi Suehiro's contributions to the field of radiation-sensitive materials exemplify her dedication to innovation. Her patents and work at Hoechst Japan Limited highlight her role as a leading inventor in this specialized area.