The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 1997
Filed:
Apr. 12, 1995
Seiya Masuda, Saitama, JP;
Munirathna Padmanaban, Saitama, JP;
Takanori Kudo, Saitama, JP;
Yoshiaki Kinoshita, Saitama, JP;
Natsumi Suehiro, Saitama, JP;
Yuko Nozaki, Saitama, JP;
Hiroshi Okazaki, Saitama, JP;
Klaus Jurgen Przybilla, Frankfurt, DE;
Hoechst Japan Limited, Tokyo, JP;
Abstract
A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base. The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.