Yuko Nozaki

Title: Yuko Nozaki: Innovator in Photosensitive Resin Technology

Introduction

Yuko Nozaki is a prominent inventor based in Saitama, Japan. She has made significant contributions to the field of photosensitive resin compositions, particularly in applications for color filter production and semiconductor elements. With a total of 4 patents to her name, Nozaki's work showcases her innovative spirit and technical expertise.

Latest Patents

One of her latest patents is a photosensitive resin composition designed for color filter production. This composition is characterized by containing a reaction product of a polymer with (3,4-epoxycylohexyl)-methyl methacrylate, a polymerization initiator, and a solvent. The composition is noted for its high sensitivity, lack of need for heat treatment between exposure and development steps, and excellent storage stability. Another significant patent involves a radiation-sensitive mixture comprising a basic iodonium compound. This mixture is intended for semiconductor element production and is developed using an aqueous alkaline solution, highlighting its high sensitivity and resolution.

Career Highlights

Yuko Nozaki is currently employed at Hoechst Japan Limited, where she continues to advance her research and development efforts. Her work has been instrumental in enhancing the performance and reliability of photosensitive materials used in various technological applications.

Collaborations

Nozaki has collaborated with notable colleagues, including Takanori Kudo and Seiya Masuda. These partnerships have contributed to the successful development of her innovative technologies.

Conclusion

Yuko Nozaki's contributions to the field of photosensitive resin technology reflect her dedication to innovation and excellence. Her patents not only advance the industry but also pave the way for future developments in semiconductor and color filter applications.