Hoechst Japan Limited

Honda Giken Kogyo Kabushiki Kaisha

Nec Corporation

Clariant Ag

Hiroshi Okazaki

Yoshiaki Kinoshita

Seiya Masuda

Munirathna Padmanaban

Georg Pawlowski

Takanori Kudo

Natsumi Suehiro

Satoru Funato

Yuko Nozaki

Klaus Juergen Przybilla

Ralph R Dammel

Natsumi Kawasaki

Hajime Endo

Hiroshi Kitagawa

Hiroo Takemura

Hans G Berscheid

Hiroshi Watanabe

Akihiro Hamada

Ryoji Nakajima

Kazuya Nagao

Yuki Nanjo

Kazuto Takatori

Shunji Senda

Tetsu Yamamoto

Akihiko Matsuo

Itsuo Kurobane

Akio Fukuda

Junko Usui

Hitoko Numata

Etsuko Ohkouchi

Natumi Suehiro

Toshiro Iwahashi

Natsumi Endo

Yukiko Tone

Isamu Sugawara

Klaus Jurgen Przybilla

Acid-labile group protected hydroxystyrene polymers having recurrent pendant groups such as 1-(2-methanecarbonyl oxyethoxy)ethoxy group and 1-(2-N-methylcarbamatoethoxy) ethoxy group. A resist containing the polymer, a photo acid generator, a base, additives and a solvent is sensitive to UV, electron beam and X-ray. In the resist, acid is formed in the exposed area during irradiation, which deprotects acid-labile group catalytically during application of post-exposure baking. Positive patterns are formed after development using an alkaline solution.

Acid-labile group protected hydroxystyrene polymers or copolymers

A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor composed of (b1) a poly(N,O-acetal) having a general formula: ##STR1## wherein R.sup.3 is alkyl or substituted or unsubstituted aryl, R.sup.4 is a divalent group selected from alkylene, cycloalkylene, alkene or alkyne, R.sup.5 is alkyl, alkene, alkyne or cycloalkyl, X is --OCO--, --CO-- or --NHCO--, and p is a number not less than 1, and/or (b2) a phenol compound having a hydroxyl group which is protected by a group which can be cleaved in the presence of an acid, (c) a photosensitive compound capable of generating an acid when exposed to an active radiation, (d) a base capable of being decomposed when exposed to an active radiation to form a neutral compound derived therefrom, (e) a plasticizer, and (f) a solvent.

Radiation-sensitive composition containing plasticizer

A process for producing a solution of a basic or non-basic sulfonium compound (A) of formulae II-V: ##STR1## wherein R.sup.5, R.sup.6 and R.sup.7 each independently represent a C.sub.1 -C.sub.18 alkyl, aryl or heteroaryl group or an aryl group mono-, di- or tri-substituted with an alkyl, an alkylaryl, an aryl, a halogen, an alkoxy, a phenoxy, a thiophenol, a phenylsulfonyl or a phenylsulphenyl;

Positive-working radiation-sensitive mixture

A radiation-sensitive composition is disclosed which includes:

Radiation-sensitive composition

A chemically amplified resist material comprising: a) a homopolymer or a copolymer of hydroxystyrene or hydroxystyrene partly protected by a group sensitive to an acid such as a tetrahydropyranyl or t-butoxycarbonyl group, b) a dissolution inhibitor such as poly(N,O-acetal) or phenol or bisphenol protected by a group cleavable with an acid, c) a photosensitive compound capable of generating an acid upon exposure, d) a base capable of degrading upon radiation to regulate the line width in a period between the exposure step and the processing steps after exposure, e) a low-molecular weight phenolic or polyphenolic compound having a structure represented by the following general formula or a mixture of the phenolic or polyphenolic compounds: ##STR1## where n is an integer of 1 to 5, m is an integer of 0 to 4, n+m.ltoreq.5, and p is an integer of 1 to 10, each R is a C.sub.1 -C.sub.12 alkyl group or an unsubstituted or substituted cycloalkyl group or a C.sub.1 -C.sub.5 hydroxyalkyl group, provided that hydrogen atoms may be substituted with a halogen atom and, when m is not less than 2, each R may be the same or different; A represents a hydrocarbon atomic grouping, having a valence of p, including an unsubstituted or substituted C.sub.1 -C.sub.100 alicyclic, chain aliphatic, or aromatic hydrocarbon or a combination thereof with the carbon atoms being optionally substituted with an oxygen atom, provided that when p is 1, A may represent a hydrogen atom and, when p is 2, A may represent --S--, --SO--, --SO.sub.2 --, --O--, --CO--, or a direct bond, and f) a solvent for dissolving the components a) to e).

Radiation sensitive composition

A frame structure for a motorcycle provided with a sub-frame extending forwardly from pivot plates fixed at the lower ends of a main frame. The sub-frame includes a U-shaped member having right and left opening ends thereof connected to the pivot plates at the lower ends of the main frame. The sub-frame extends approximately horizontally and forwardly from the connecting portions so that the front end portion of the sub-frame is not connected to the down frames.

Frame structure for a motorcycle

A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.

Pattern forming material including photoacid and photobase generators

A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base. The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.

Radiation-sensitive mixture comprising a basic iodonium compound

Colored, photosensitive resin composition

To provide a compact exhaust apparatus for allowing exhaust sounds of each cylinder to be heard. A muffler includes a tubular member the inside of which is divided into three independent expansion paths by partition plates. The partition plates extend in an axial direction. Each of the expansion paths is divided into a first expansion chamber, a second expansion chamber and a third expansion chamber by diametrical partitions. The first expansion chamber and the second expansion chamber are in communication with each other by way of a pipe while the second expansion chamber and the third expansion chamber are communicated with each other by way of a second pipe. A tail pipe is connected to each pipe to discharge exhaust gas to the outside.

Exhaust pipe structure for a motorcycle

A chemically amplified radiation sensitive composition comprising: (a) a copolymer such as poly(4-hydroxystyrene-co-styrene), (b) a dissolution inhibitor such as polyacetal or (b') a crosslinking agent, (c) a radiation sensitive compound capable of generating an acid upon exposure to actinic radiation, (d) a radiation sensitive base capable of stabilizing the width of lines throughout steps from exposure to post-exposure bake treatment, and (e) a solvent for dissolving the components (a) to (d), can realize fine lines and spaces down to 0.22 microns, for example, using KrF laser, and possesses excellent heat and etch resistance and adhesiveness to substrates, and produces patterns with low standing waves arising due to substrate reflectiveness of exposed light.

A novel positive-working radiation-sensitive mixture having a high sensitivity to radiation in a short-wavelength UV region is provided which can be developed in an aqueous alkaline solution, has a stable acid latent image and is used for the production of a semiconductor. The mixture comprises, as indispensable components, a) a binder insoluble in water but soluble in an aqueous alkaline solution, b) a compound having at least one bond cleavable with an acid, c) a compound capable of producing an acid upon radiation, and d.sub.1) a basic ammonium compound or d.sub.2) a basic sulfonium compound.

In a fuzzy inference operation method according to the present invention, the condition part membership function is referred to according to a singleton input variable so as to determine the condition part membership value and then the determined condition part membership value is judged whether it is the minimum value for a membership value. If so, the minimum value is used as the desired membership value and the system omits the MIN and MAX value operations for the applicable condition part membership value and jumps to the MIN-MAX operation under the next rule. Besides, a fuzzy inference operation device comprises a condition part membership value judgment means to judge whether the condition part membership value determined by the condition part membership value determining means is the minimum membership value or not and a control means which omits the operations by the MIN value operation means and the MAX value operation means for the applicable condition part membership value if it is judged to be the minimum membership value.

Fuzzy inference operation method and a device therefor

Cytorhodin S derivatives, especially cytorhodin S-immunoglobulin complexes are disclosed. Cytorhodin S possesses very high anticancer activity, but the complexes act more selectively on cancer cells and are more useful as an anticancer agent. New intermediate derivatives are also useful as an anticancer agent.

Cytorhodin S derivatives and a process for their preparation

Growing community of inventors

Saitama, Japan

Hiroshi Okazaki