Itami, Japan

Hiroshi Harada


Average Co-Inventor Count = 3.7

ph-index = 8

Forward Citations = 162(Granted Patents)


Location History:

  • Kawanishi, JP (1982 - 1984)
  • Amagasaki, JP (1984)
  • Hyogo, JP (1983 - 1990)
  • Itami, JP (1984 - 1991)

Company Filing History:


Years Active: 1982-1991

Loading Chart...
12 patents (USPTO):Explore Patents

Title: Hiroshi Harada: Innovator and Contributor to Semiconductor Technologies

Introduction

Hiroshi Harada, an accomplished inventor based in Itami, Japan, has made significant contributions to the field of semiconductor technology. With a total of 12 patents to his name, he has developed innovative methods that enhance the manufacturing processes of electronic devices.

Latest Patents

Harada's latest patents include a cutting-edge method of forming a silicide film and a novel approach for fabricating semiconductor devices. The method of forming a silicide film involves depositing a metallic silicide film that contains silicon at a concentration exceeding stoichiometric levels onto a substrate. Following this, a film of aluminum or an aluminum alloy is deposited, after which a heat treatment is applied. This process facilitates the precipitation of silicon from the metallic silicide film into the aluminum, ultimately lowering the silicon concentration in the silicide film.

His patent titled "Method for Fabricating Semiconductor Device" outlines a semiconductor device that includes a silicon substrate with an insulator layer formed on top. It also describes a contact hole that extends through the insulator layer and a filler of doped silicon grown on the silicon substrate within this hole. This innovation highlights Harada's expertise in solid phase precipitation from alloy films, showcasing his commitment to advancing semiconductor technologies.

Career Highlights

Harada has worked for notable companies, including Mitsubishi Electric Corporation and Mitsubishi Electric Corporation LSI Development Laboratory. His roles in these organizations have enabled him to spearhead advancements in semiconductor manufacturing processes and contribute to the development of various electronic components.

Collaborations

Throughout his career, Harada has had the opportunity to collaborate with esteemed professionals such as Haruhiko Abe and Yoshihiro Hirata. These partnerships have not only enhanced his innovative capabilities but have also contributed significantly to the collective pursuit of breakthroughs in semiconductor technology.

Conclusion

In summary, Hiroshi Harada's contributions to the field of semiconductor technology through his 12 patents demonstrate his inventiveness and dedication to innovation. His work, specifically in methods for forming silicide films and fabricating semiconductor devices, positions him as a key figure in advancing electronic manufacturing processes. His collaborations with industry experts and tenure at prominent companies underscore the importance of teamwork in propelling technological advancement.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…