The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1982
Filed:
Sep. 24, 1980
Applicant:
Inventors:
Haruhiko Abe, Itami, JP;
Yoji Mashiko, Itami, JP;
Hiroshi Harada, Kawanishi, JP;
Sotoju Asai, Amagasaki, JP;
Kazuo Mizuguchi, Amagasaki, JP;
Sumio Nomoto, Itami, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156628 ; 156643 ; 156646 ; 156656 ; 1566591 ; 156665 ; 2041 / ; 2041 / ; 427 38 ; 427 431 ;
Abstract
A thin aluminum film 3 is formed on the top surface of a substrate 2, 1. Selected areas of the aluminum film are irradiated by an oxygen ion beam 6 to form implanted regions 7. The surface is then plasma etched, with the oxygen ion implanted regions serving as a mask to thereby prevent the removal of the underlying areas of the aluminum film.