The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1982
Filed:
Sep. 24, 1980
Applicant:
Inventors:
Haruhiko Abe, Itami, JP;
Yoji Mashiko, Itami, JP;
Hiroshi Harada, Kawanishi, JP;
Sotoju Asai, Amagasaki, JP;
Kazuo Mizuguchi, Amagasaki, JP;
Sumio Nomoto, Itami, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156628 ; 156643 ; 156646 ; 156656 ; 1566591 ; 156665 ; 2041 / ; 2041 / ; 427 38 ; 427 431 ;
Abstract
A thin aluminum film 3 is formed on the top surface of a substrate 2, 1. Selected areas of the aluminum film are irradiated by an oxygen ion beam 6 to form implanted regions 7. The surface is then plasma etched, with the oxygen ion implanted regions serving as a mask to thereby prevent the removal of the underlying areas of the aluminum film.
Abe, Haruhiko. (1982). Method for forming a fine pattern of an aluminum film (U.S. Patent No. 4314874). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4314874
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile