Company Filing History:
Years Active: 1982-1983
Title: The Innovative Contributions of Sumio Nomoto
Introduction
Sumio Nomoto is a distinguished inventor based in Itami, Japan. He has made significant contributions to the field of plasma etching, with a focus on methods that enhance the precision of pattern formation. With a total of 2 patents to his name, Nomoto's work has had a notable impact on the industry.
Latest Patents
Nomoto's latest patents include a method for forming patterns by plasma etching and a method for forming a fine pattern of an aluminum film. The first patent describes a technique where ions of a metal that become passive in the presence of oxygen are implanted into selected portions of a workpiece's surface. This workpiece is then subjected to plasma etching with a reaction gas mixed with oxygen, allowing the passive layer to act as a mask and form an etched pattern. The second patent details the formation of a thin aluminum film on a substrate, where selected areas are irradiated by an oxygen ion beam to create implanted regions. Plasma etching is then performed, using the implanted regions as a mask to protect the underlying areas of the aluminum film.
Career Highlights
Sumio Nomoto has built a successful career at Mitsubishi Electric Corporation, where he has been able to apply his innovative ideas and techniques. His work has contributed to advancements in semiconductor manufacturing and other related fields.
Collaborations
Nomoto has collaborated with notable colleagues, including Haruhiko Abe and Yoji Mashiko, to further enhance the research and development of plasma etching technologies.
Conclusion
Sumio Nomoto's contributions to the field of plasma etching demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to precision and efficiency in manufacturing processes.