The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1983
Filed:
Oct. 09, 1980
Applicant:
Inventors:
Yoji Mashiko, Nishinomiya, JP;
Hirozo Takano, Takarazuka, JP;
Haruhiko Abe, Takarazuka, JP;
Sotoju Asai, Amagasaki, JP;
Kazuo Mizuguchi, Amagasaki, JP;
Sumio Nomoto, Itami, JP;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
2191 / ; 2191 / ; 2191 / ; 156628 ; 156643 ; 156646 ; 2041 / ;
Abstract
Ions of a metal which becomes passive under the presence of oxygen with regard to plasma etching are implanted into selected portions of the surface of a workpiece, after which the workpiece is subjected to plasma etching with a reaction gas mixed with oxygen, whereby that layer which has been rendered passive acts as a mask, and an etched pattern is formed.