The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 1982
Filed:
Nov. 24, 1980
Applicant:
Inventors:
Haruhiko Abe, Takarazuka, JP;
Masao Nagatomo, Itami, JP;
Natsuro Tsubouchi, Kawanishi, JP;
Hiroshi Harada, Kawanishi, JP;
Junichi Mitsuhashi, Sakai, JP;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ; H01L / ;
U.S. Cl.
CPC ...
2957 / ; 148-15 ; 156628 ; 357 65 ; 427 38 ;
Abstract
A thin film of a metal which is capable of oxidation and sublimation is formed on a major surface of a semiconductor substrate, and a portion of a major surface of the thin metallic film is irradiated with an oxygen ion beam to convert a portion of the thin metallic film to an oxide, and subsequently the thin metallic film is heat treated to remove the oxide by sublimation, whereby electrodes or wiring for a semiconductor integrated circuit are formed by the remaining thin metallic film.