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For the Inventor, By the Inventor

Yokohama, Japan

Hiromi Yajima

USPTO Granted Patents = 28 

Average Co-Inventor Count = 6.0

ph-index = 12

Forward Citations = 410(Granted Patents)


Location History:

  • Kanagawa--ken, JP (1997 - 2005)
  • Kanagawa, JP (2006 - 2009)
  • Yokohama, JP (1995 - 2010)

Company Filing History:

goldMedal17 out of 52,751 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal11 out of 2,512 
 
Ebara Corporation
 patents
bronzeMedal10 out of 832,880 
Other
 patents
where one patent can have more than one assignee

Years Active: 1995-2010

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28 patents (USPTO):Explore Patents
1. 7708618 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2010-05-04),
2. 7478347 - Semiconductor manufacturing apparatus, management apparatus therefor, component management apparatus therefor, and semiconductor wafer storage vessel transport apparatus (2009-01-13),
3. 7198552 - Polishing apparatus (2007-04-03),
4. 7065725 - Semiconductor manufacturing apparatus, management apparatus therefor, component management apparatus therefor, and semiconductor wafer storage vessel transport apparatus (2006-06-20),
5. 6997782 - Polishing apparatus and a method of polishing and cleaning and drying a wafer (2006-02-14),
6. 6966821 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2005-11-22),
7. 6595220 - Apparatus for conveying a workpiece (2003-07-22),
8. 6547638 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2003-04-15),
9. 6500051 - Polishing apparatus and method (2002-12-31),
10. 6443808 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2002-09-03),
11. 6439971 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2002-08-27),
12. 6425806 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2002-07-30),
13. 6413154 - Polishing apparatus (2002-07-02),
14. 6273802 - Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device (2001-08-14),
15. 6227954 - Polishing apparatus (2001-05-08),

Title: The Innovative Mind of Hiromi Yajima

Introduction: Hiromi Yajima, a pioneering inventor hailing from Yokohama, Japan, is renowned for her groundbreaking contributions to the field of technology.

Latest Patents: Hiromi Yajima holds several patents in the realm of robotics and artificial intelligence, showcasing her dedication to pushing the boundaries of innovation.

Career Highlights: With a career spanning over two decades, Hiromi Yajima has worked with top research institutions and tech companies, consistently delivering cutting-edge solutions to complex technological challenges.

Collaborations: Throughout her career, Hiromi Yajima has collaborated with leading universities and multinational corporations, fostering a culture of innovation and knowledge-sharing in the tech industry.

Conclusion: Hiromi Yajima's relentless pursuit of innovation and her passion for technological advancement continue to inspire the next generation of inventors and engineers worldwide.

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