Location History:
- Tokorozawa, JP (2003 - 2005)
- Tachikawa, JP (1998 - 2007)
- Iruma, JP (2002 - 2012)
Company Filing History:
9 out of 42,517 
5 out of 217 
3 out of 3,781 
Years Active: 1998-2012
Title: **Hiromi Shimamoto: Innovator in Semiconductor Technology**
Introduction: Hiromi Shimamoto, hailing from Iruma, Japan, is a notable inventor with an impressive portfolio comprising 22 patents. His groundbreaking work primarily revolves around the development and refinement of semiconductor devices, showcasing his expertise and dedication to innovation in this vital field of technology.
Latest Patents: Among Hiromi Shimamoto's latest inventions is a patent concerning a semiconductor device and its manufacturing method. This innovative semiconductor device features a lower-surface oxidation preventing insulating film, an upper-surface oxidation preventing insulating film, and a side-surface oxidation preventing insulating film. Each film is strategically designed to mitigate the impact of oxidation on the metal resistor element. The method employs anisotropic etching, allowing a simplified fabrication process while preventing increases in resistance value and parasitic capacitance between metal wiring layers. This invention not only enhances device performance but also streamlines manufacturing.
Career Highlights: During his career, Hiromi Shimamoto has worked with reputable companies, including Hitachi, Ltd., where he contributed significantly to the field of semiconductor technology. His extensive patent portfolio underscores his innovative spirit and commitment to advancing electronic components, which are central to modern technology.
Collaborations: Throughout his professional journey, Shimamoto has collaborated with skilled colleagues such as Katsuyoshi Washio and Masao Kondo. These partnerships have likely fostered an environment of creativity and innovation, facilitating the development of advanced technological solutions in semiconductor manufacturing.
Conclusion: Hiromi Shimamoto stands out as an influential inventor within the semiconductor industry. His contributions, particularly in the realm of oxidation prevention in metal resistor elements, demonstrate his capability to bridge the gap between theoretical innovation and practical application. As technology continues to evolve, the impact of his inventions will undoubtedly resonate in future developments within the field.